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Zinc (Zn) Sputtering Targets, indium

Zinc (Zn) Sputtering Targets, indium
Regular price Rp 27.012.000,00
Regular price Sale price Rp 27.012.000,00
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Zinc (Zn) sputtering targets are solid plates of metallic zinc used as the source material in physical vapor deposition (PVD) sputtering systems. Under ion bombardment in a vacuum chamber, zinc atoms are ejected from the target surface and deposited onto a substrate to form a thin film. As a metal sputtering material, zinc targets are commonly used in research on coatings and functional thin layers.

  • Quantity: 1 piece

For technical specifications, CoA, or a quotation, please contact AMI Scientific.

  • Deposition of metallic zinc thin films for corrosion-protection coating research
  • Reactive sputtering to prepare zinc oxide (ZnO) films for optoelectronic studies
  • Electrode and contact layer development in solar cell and battery research
  • Fundamental studies of thin-film growth and surface properties

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