Zinc (Zn) sputtering targets are solid metallic source materials used in physical vapor deposition (PVD) to produce zinc-based thin films. Zinc is a widely studied metallic element in semiconductor, optoelectronic, and coating research. The Nanografi sputtering target serves as a controlled deposition source for laboratory and pilot-scale processes. Its sputtering behavior depends on target density, bonding, and deposition parameters.
- Quantity: 1 piece
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- Deposition of zinc-based thin films for semiconductor research
- Preparation of zinc-containing precursor layers for optoelectronic device studies
- Functional and protective coating development
- Thin-film process optimization in university and industrial laboratories
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