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Nanografi

Zinc (Zn) Sputtering Targets

Zinc (Zn) Sputtering Targets
Regular price Rp 5.454.000,00
Regular price Sale price Rp 5.454.000,00
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Zinc (Zn) sputtering target is a solid metallic source material used in physical vapor deposition (PVD) to produce thin films through sputtering. As a metal target, it belongs to the group of metallic sputtering materials and is commonly used in research to deposit zinc-based and oxide films.

  • Quantity: 1 piece

For technical specifications, certificate of analysis (CoA), or quotation, please contact AMI Scientific.

  • Deposition of zinc oxide (ZnO) thin films for transparent conductive layers
  • Research on optoelectronic and semiconductor devices
  • Development of protective and functional metallic coatings
  • Thin-film studies for solar cell and sensor prototypes

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