This zinc (Zn) sputtering target from Nanografi has a purity of 99.99%, a size of 2'' and a thickness of 0.250''. It serves as the source material in sputter deposition, where atoms are eroded from the target and laid down as a thin film on a substrate such as a silicon wafer.
Sputtering can coat substrates of many shapes and sizes, and results are repeatable. A process developed in small R&D work can be scaled up to production batches covering medium to large substrate areas.
Depending on process conditions, chemical reactions may take place on the target surface, in flight or on the substrate. The large number of adjustable parameters makes sputtering complex, but it also gives experienced users close control over film growth and microstructure.
- Deposition of zinc thin films onto substrates such as silicon wafers.
- Sputter etching where strong etching anisotropy is required and selectivity is not critical.
- Material analysis by sputtering, as in secondary ion mass spectrometry (SIMS), to determine composition and detect very low impurity levels.
- Research related to space weathering, in which sputtering alters the surfaces of airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.99% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01ZN15
- Material: Zinc (Zn)
- Size: 2''
- Thickness: 0.250''
- Product code: NG0ST01ZN15
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