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Nanografi

Zinc (Zn) Sputtering Targets

Zinc (Zn) Sputtering Targets
Regular price Rp 12.343.000,00
Regular price Sale price Rp 12.343.000,00
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Zinc (Zn) sputtering targets are solid metal plates used as the source material in physical vapor deposition (PVD) sputtering systems. Zinc is a bluish-white metallic element. In a vacuum chamber, energetic ions bombard the target surface and eject zinc atoms that deposit onto a substrate as a thin film. Sputtering targets are commonly used in research laboratories and industrial coating processes where control over film thickness and composition is important. Nanografi offers this material as part of its range of sputtering targets for thin-film research and development.

  • Quantity: 1 piece

For technical specifications, Certificate of Analysis (CoA), or quotation, please contact AMI Scientific.

  • Deposition of zinc-based thin films for semiconductor and optoelectronic research
  • Development of oxide and transparent conductive layers through reactive sputtering
  • Studies of protective and corrosion-resistant coatings on metal substrates
  • Fabrication of test structures for sensor and solar cell prototyping

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